庄占兴, 路福绥, 刘月, 陈甜甜, 罗万春. 萘磺酸甲醛缩合物分散剂在氟铃脲颗粒表面的吸附性能研究[J]. 农药学学报, 2008, 10(4): 477-482.
    引用本文: 庄占兴, 路福绥, 刘月, 陈甜甜, 罗万春. 萘磺酸甲醛缩合物分散剂在氟铃脲颗粒表面的吸附性能研究[J]. 农药学学报, 2008, 10(4): 477-482.
    ZHUANG Zhan-xing, LU Fu-sui, Liu Yue, CHEN Tian-tian, LUO Wan-chun. Studies on the Adsorption Properties of NNO Dispersant on the Surface of Hexaflumuron Particles[J]. Chinese Journal of Pesticide Science, 2008, 10(4): 477-482.
    Citation: ZHUANG Zhan-xing, LU Fu-sui, Liu Yue, CHEN Tian-tian, LUO Wan-chun. Studies on the Adsorption Properties of NNO Dispersant on the Surface of Hexaflumuron Particles[J]. Chinese Journal of Pesticide Science, 2008, 10(4): 477-482.

    萘磺酸甲醛缩合物分散剂在氟铃脲颗粒表面的吸附性能研究

    Studies on the Adsorption Properties of NNO Dispersant on the Surface of Hexaflumuron Particles

    • 摘要: 采用残余质量浓度法、ζ电位仪、红外光谱(IR)和X射线光电子能谱(X-Photoelectron spectroscopy, XPS)系统地研究了萘磺酸甲醛缩合物(NNO)分散剂在氟铃脲颗粒表面的吸附量、吸附状态、ζ电位、吸附作用力、吸附层厚度等性能。结果表明:NNO在氟铃脲表面的饱和吸附量、Langmuir吸附平衡常数k和ζ电位均随NNO相对分子质量增加而增大, NNO分散剂在氟铃脲表面呈多点吸附,吸附了NNO的氟铃脲的IR谱具有明显的"红移"现象,说明氢键是分散剂NNO与氟铃脲表面结合的重要作用力, NNO在氟铃脲颗粒表面的吸附层厚度为5.97 nm, 分析认为,NNO在氟铃脲颗粒表面吸附后具有静电排斥和空间位阻双重作用,可以较好地维持氟铃脲悬浮剂的分散稳定性。

       

      Abstract: The adsorption properties of naphthyl sulfonate formaldehyde condensation(NNO) dispersant on the surface of hexaflumuron,such as adsorbed amounts,adsorption state,ζ potential,adsorption force,the adsorption layer thickness,were studied with remnants of concentration,ζ potential instrument,IR and XPS(X-photoelectron spectroscopy) at laboratory conditions. The results showed that the saturated adsorption of NNO dispersant on the surface of hexaflumuron particles and ζ potential increased with dispersant molecular weight and the fitting Langmuir equilibrium constant k of the adsorption of NNO dispersant increased with the molecular weight. The adsorption state is shown to be a multipoint type,and the clear "red shift" phenomenon was found on the surface of hexaflumuron particles adsorbed NNO.Hydrogen bond is important force in the combination and the surface layer thickness of the adsorption is 5.97 nm.Electrostatic exclusion and stereo-hindrance effect produced on the surface of hexaflumuron particles absorbing NNO dispersant can maintain the stability of hexaflumuron SC system.

       

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